美国udmaklc300系列浓缩晶圆切削液
l aklc300洗涤剂浓缩液是一种可生物降解、水性、非碱性、非酸性物质
l pv wafer cleaning afterwafering
用于切片之后对光伏硅片进行清洗
l di /ro water: detergent dilution ratio –1000:1 to 500 :1
去离子水/反渗透水:洗涤剂溶液比例– 1000:1至500:1
l applicationtemperature: 45°c -70°c
使用温度：45°c -70°c
l excellent wetting, cleaning and rinsingproperties
极好的湿润、清洁和冲洗功能
l water surface tensionreducer
降低去离子水/反渗透水表面张力
l completely cleans out sic (silicon carbide) dust and other contaminants onwafer surfaces
可以彻底清洁硅片表面的碳化硅(sic)尘埃以及其他脏污
l cleans and eliminates cu (copper) and fe(iron) on pv wafer surfaces after wafering and de-gluingprocess.
在切片以及去胶工序之后彻底清除光伏硅片表面的铜和铁
l biodegradable, non-hazardous and henceeasily disposable
可生物降解、无危害，可以很容易进行处置
l biochemical oxygen demand (bod) <2.0 mg/l (bod less than 2.0 mg/l)
生化需氧量(bod) < 2.0 mg/l (bod小于2.0 mg/l)
l chemical oxygen demand (cod) <10.0 mg/l (cod less than 10.0 mg/l)
化学需氧量(cod) < 10.0 mg/l (cod小于10.0mg/l)
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